1 National Kaohsiung First University of Sci. & Tech. Introduction of Cleanroom MicroSystem Fabrication Lab. NKFUST MEMS Lab. 2

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1 1 National Kaohsiung First University of Sci. & Tech. Introduction of Cleanroom MicroSystem Fabrication Lab. 2

2 2 3 4

3 3 5 (Facility Dept.) (System) 1. (Utility Supply System) utility UPW (Ultra Pure Water) Gas Supply System, Clean Dry Air, Industrial Air, and Utility Air Chemical Supply System Electrical Power PX PX (Process Cooling Water, Process Vacuum, Cleaning Vacuum) CW (City Water) 2. (Environment System) : Clean Room Office Space (,, ) Telephone System PA (Public Address) Security System 6

4 4 3. (Waste Treatment System) WWT / WWC (Waste Water Treatment / Waste Chemical Collection) AAS (Air Abatement System) 4. (Pipe Engineering & Control System) (Piping) (Ducting) (Wiring), (FMCS Facility Management Control System) (Wafer Production) 7 Clean room system Security Telephone Power system Gas Gas system FAB Operation UPW system Chemical system PA PA CW CW PX PX WWT/WCC system FMCS Abatement system 8

5 5 Clean Room Clean Room Clean Room 9 10

6 6 SMIF: standard mechanical interface 11 Clean Room : Clean Room, (FAB) (OUTSIDE AIR) Clean Room Make-up Air Unit (MAU) (particle) (Mech. Chase) clean room (Dry Cooling Coil) Clean Room Fan Filter Unit (FFU) Clean Room particle ultra-low penetration air (ULPA Filter) Fab 12

7 C~27 C, 55%~70% ; 22 C~24 C, 40%~45% 2., ± 1 C ± 3% 3.,,,,, ,, Stepper,,, 24 5., particle, ULPA filter,, 6., 14

8 8 Heat Absorption & Rejection Solar Loads OA Loads Internal Loads 15 MAU OA load Internal load FFU DCC Solar load Internal load PCW 16

9 9 ELECTRICAL ELECTRICAL : : Equipment Power Equipment Power Lighting Lighting Receptacles Receptacles Grounding Grounding EVIROMENT EVIROMENT CONTROL CONTROL AMC Control AMC Control Electrostatic Electrostatic Particle,Temp,Humidity Particle,Temp,Humidity CONTROL CONTROL : : Clean Room Control Clean Room Control FFU Control FFU Control Public Address Public Address CLEAN ROOM ENGINEERING C.R. C.R. INTERIOR INTERIOR : : HEPA Filter Ceiling HEPA Filter Ceiling Raised Floor Raised Floor Clean Room walls Clean Room walls Clean Staircase Clean Staircase Air Shower/ Tunnel Air Shower/ Tunnel Clean-up Clean-up MECHANICAL MECHANICAL : : Recirculation Air System Recirculation Air System Makeup Air System Makeup Air System Smoke Purge / Calamity Smoke Purge / Calamity Filter Fan Unit Filter Fan Unit Chilled Water System Chilled Water System Hot Water System Hot Water System Drainage Drainage Pipe Pipe Rack Rack / / Penetrations Penetrations I. I. S. S. E. E. P. P. : : Fire Alarm Fire Alarm Smoke detector Smoke detector VESDA VESDA Fire Protection Fire Protection Sprinkler /Extinguisher Sprinkler /Extinguisher Hydrant box Hydrant box 17 Clean Room System Configuration Penthouse Outside air intake Smoke purge fan Air washer Mezzanine Level Makeup air unit Booster fan Dry cooling coil Interstitial Level Filter fan unit Catwalk Process Level Raised floor area Gowning Clean Sub Fab Return air plenum 18

10 10 AIR BALANCE DIAGRAM O.A MAU Mech. Chase Dry Cooling Coil FFU Clean Sub FAB FAB ULPA Filter EXH.& Pressurization & 19 concrete Bracing Supply air duct FFU Ceiling grid 4.6m See through light partition Clean room partition Raised floor Tool Tool 20

11 kv Switch 161kv/22.8kv TPC 22.8kv Tools Busway 22.8kv/480v & 208v 22

12 12 (FMCS), ;,. FMCS 1.Clean Room 7.Chemical 2.PCW 3.AAS 4.UPW 5.WWT 6.Gas 8.HVAC 9.Calamity 10.PV 11.CV 12.CDA 23 DCS Console,,,. Engineer WorkStation,. Controller Backup Controller A I/O card D I/O card Controller & I/O I/O card.. Clean Room,Water,Air- Abatement,HVAC,Utility. 24

14 14 Airborne Molecular Contamination Class A,B,C,D (according to SEMI F21-95) MC(Moecular Condensates) 27 28

16 31 60GPM, 120GPM GALLON PER MINUTE)[ ] 15 27 18M -cm AT 25 TOC 30ppb PARTICLE<10 pcs/ml(0.

16 GPM, 120GPM GALLON PER MINUTE)[ ] M -cm AT 25 TOC 30ppb PARTICLE<10 pcs/ml(0.1um or greater) DISSOLVED OXYGEN 50ppb PRESSURE=2.8kg/cm2 Note: 1. TOC: total organic carbon ( ) 2. ppb: parts per billion

17 17 ITEM 1 Resistivity 18 M.cm at 25 o C 2 Particles <10 pcs/ml, (0.1um or greater) <1 CFU/100ml, as determined by membrane 3 Bacterial filter after 72Hrs incubaloedet 30 o C 4 TOC 30 ppb 5 Dissolved oxygen 50 ppb 6 Dissolved SiO2 3 ppb 7 Na 0.1 ppb 8 K ppb 9 Cu 1.0 ppb 10 Zn 1 ppb 11 Fe 0.5 ppb 12 Cr 0.1 ppb 13 Mn 0.5 ppb 14 Cl ppb 15 Residue 10 ppb 16 Pressure 2.8 kg/cm 2 17 Flow Rate Ave.= 60 GPM, Peak= 120 GPM 18 Temperature o C 33 (ultrapure water production system) : (pretreatment system) (primary treatment system) (ultrapure water system) (piping system) (waste water reclamation system) 34

18 18 ( 10) (coagulation) (settling) (filtration) ( 10) (microfloc filtration) (flocculant) 35 (primary treatment system) : (1) (membrane system) (reverse osmosis RO [organics] [colloid]) (ultrafiltration UF) (membrane filter) (2) (ion-exchange system) (two-bed ultrapure water unit 2B tower) (mixed-bed ion-exchange tower MB tower) (oxidants) (trace ions) (3) (deaeration system) (degasifier DG tower) (vacuum degasifier VDG tower) ( ) (4) (ultraviolet sterilizer UV: [sterilization] [ - ]) 36

19 19 (ultrapure water system subsystem the secondary treatment system) (piping system): (point of use POU) (circulating water) (water entrapment) (piping bend) ( dead zone) 10-20% 37 ( ) 38

20 20 HF BOE ( ) 39 : 40

21 21 H2 N2 O2 He CF 4 CH 4 Ar NO NF 3 SiF 4 WF 6 Si 2 H 6 PH 3 B 2 H 6 SiH 4 41 GeH 4 NH 3 SF 6 HCl Cl 2 HBr N 2O ( ) SiCl 4 BCl 3 SiH 2Cl 2 CHF 3 C 2F 6 C 4F 8 D 2 42

22 22 ( ) 43 ( :GRC CS195SC ) local scrubber ( 800 C) local scrubber 44

23 23 References W. Whyte, Clean Room Technology Fundamentals of Design Testing and Operation, John Wiley and Sons, Inc., 2001.,,, Vol. 7, No. 4, pp ,,, Vol. 9, No. 1, pp , CDO,, Vol. 9, No. 4, pp , (I),, Vol. 9, No. 2, pp , (II),, Vol. 9, No. 3, pp

V.S HOW?! Page 2/51

2011 / / / / /Facility/Gas & Chemical section V.S HOW?! Page 2/51 : 1. ( ) 2. ( ) 3. 2,100 ( ) HOW?! WHO?! NEW?! NEW?! Page 3/51 ( / ) / : 1. 2. 3. SUMMARY & Q & A TMAH Page 4/51 SUMMARY & Q & A TMAH Page