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EM 200 ISBN 978-0-578-06276-1
(There s Plenty of Room at the Bottom)... 2... 3...9...20...26 DualBeam...28...32...34
2 (There s Plenty of Room at the Bottom) 1959 12 29 1959 12 29 (Richard Feynman) (Caltech) (There s Plenty of Room at the Bottom) 2009 50 100 100 0.05 nm 20 FEI 20 30 1949 EM100 FEI FEI
mikros skopeo 17 (Antony van Leeuwenhoek) (1632-1723) 400 (Leeuwenhoek) 550 0.2 mm 0.2 mm LCD
4 (7 μm) (100 μm) LM 1000 200 nm 100 nm 10 Ernst Ruska 1931 (TEM) 1986 100 nm 0.05 nm 4000 400 Ernst Ruska 20 20 TU Berlin TEM (1 pm = 10-12 m) (400-700 nm) 10 high frequency low frequency wavelength wavelength good resolution poor resolution
5 light microscope electron source TEM first condenser lens objective lens light beam specimen light source SEM electron source anode gun align coils lens 1 lens 2 electron beam scan & stig coils lens 3 collector system condenser aperture objective aperture selected area aperture second condenser lens objective condenser lens minicondenser lens specimen (thin) objective imaging lens diffraction lens intermediate lens first projector lens second projector lens Ga + LMI source suppresser extractor lens 1 projection chamber fluorescent screen FIB octopole alignment blanking plates blanking aperture scan & stig octopoles lens 2 continuous dinode detector 1800 secondary electrons electron beam impact area specimen (thick) secondary electrons or ions ion beam impact area specimen (thick) vacuum turbo/diff pump turbo/diff pump roughing line roughing line 1
6 Max Knoll 1935 Manfred von Ardenne 1937 (SEM) 1942 Zworykin Hillier Snijder 50 nm 1 nm 1 projector screen fluorescent screen aperture objective lens objective lens slide condenser lens specimen (thin) 2 slide projector light source condenser lens TEM electron beam electron source (nanobridge) Titan 80-300
7 TEM SEM (STEM) Manfred von Ardenne 1938 Philips EM200 (Philips Electronic Instruments) Ong Sing Poen STEM 1969 25 nm STEM TEM STEM 0.05 nm (FIB) SEM (Ga + ) FIB FIB FIB SEM (FIB/SEM) FEI DualBeam FIB/SEM SEM 2000 nm (10 9 ) μm (10-6 ) 1000 nm Ångström, Å 0.1 nm micron (10-12 )
8 ant 200 nm 1000 (200 nm) (0.2 mm) 10-2 (1 cm) 10-3 (1 mm) plant cell Antony van Leeuwenhoek 1632-1723 10-5 (10 μm) 10-6 (1 μm) 10-8 (10 nm) animal cell yeast virus Robert Hooke 1635-1703 Ernst Abe 1840-1905 Ernst Ruska 1906-1988 protein complex 10-10 (0.1 nm) 3
9 / 0.5 μm Al-Cu-Li-Mg-Ag STEM Titan 80-300
10 (LaB 6 lab 6 ) (FEG) 1000 LaB 6 Wehnelt 2700 C 2000 Wehnelt 4). LaB 6 LaB 6 10 LaB 6 TEM electron source condenser system specimen (thin) objective lens projector lens
11 X Schottky Schottky Schottky (FEI XFEG) 4-5 5-10 LaB 6 10 80 kv 150,000 / (1.5 x 10 8 m/s)300 kv 230,000 / (2.3 x 10 8 m/s) λ h p m 0 e U v c Wehnelt cylinder HIV filament electron beam filament source high voltage generator 6000 10 kv 12.3 x 10-12 m (12.3 pm) 200 kv 2.5 pm 10 (1 pa = 10 12 A) 1 / 1.6 x 10 19 6000 200,000 / 3 anode 4
12 X X TEM STEM Otto Scherzer 1947 5 (C) (P) 6): ( C s ) ( C c ) C electron beam C P P P P C C 5 C P
13 Titan TEM 6 C s C c d s = 1/2 C s 3 d c = C c ( E/E 0 ) 300 kv Si<110> C s HR-TEM Tecnai F20
14 CCD CCD CCD
15 10-8 Pa (ETEM) ETEM ETEM (EFTEM) EFTEM EFTEM X 760 760 (Pa) (SI) torr mbar = 1 bar = 1000 mbar = 100 000 Pa = 760 torr = 760 2.5 x 10 5 Pa 7 x 10 12
16 X Y Z X Y Z
17 3 20 nm 300-500 nm 0.5 μm 3 mm 0.1 μm (LACBED)
18 3 mm 0.3 mm ( 0.1 μm) (FIB) (Vitrobot ) vitrobot
19 CAT MRI SPA SPA SPA SPA
20 1 nm (SE) SEM electron source anode gun align coils lens 1 lens 2 electron beam scan & stig coils lens 3 collector system secondary electrons electron beam impact area specimen (thick) vacuum turbo/diff pump roughing line
21 50-30000 (BSE) X STEM (ev) X SE BSE SE BSE X 600 FEI Quanta
22 EBIC SE BSE 1 nm 1 kv X X-ray 7 SE X BSE SE STEM X BSE 1 kv 1
23 50 ev 8 BSE BSE SE 2000 = 0.25 mm 2000 nm (2 μm) 250,000 H 2 O 0 C 600 Pa 4.6 torr 4.6 mm 650-1300 Pa (5-10 torr)
24 (ESEM) ESEM 9) / ESEM X 1-10 nm
25 X Y Z detector signal amplification in the ESEM primary electron beam gaseous environments cascade amplification X Y 50 300 360 secondary electrons 9 ESEM STEM STEM X X
26 STEM STEM X STEM 0.05 nm STEM STEM (SE) STEM (BSE) STEM (HAADF) BSE HAADF Z X X X X (EDX) X 100nm STEM 10-20nm STEM X Ångstrom X 10-12 X X X X X FEI Tecnai Osiris
27 1 X (WDX) X X X WDX EDX X X (EELS) EELS STEM X X X X X X X
28 DualBeam 2000 250 1 (FIB) FIB FEI DualBeam FIB 52 FIB FIB 1nA v2a EE IB milling-002 FIB
29 FIB / FIB (LMIS) LMIS ZnO FIB (LMIS)
30 5 20-30 1 LMIS 100 // FIB 50 LIMIS SEM FIB 10 DualBeam 52 FIB 100 Å 1000 Å Taylor cone 11 Boersch
31 LMIS LMIS FEI 1000 FEI (ALU)
32 X NMR EM (MEMS) FIB DualBeam S/TEM S/TEM
33 - (nanocharacterization) STEM TEM DualBeam (EBSD) X (EDSX) TEM (EFTEM) nanoprocesses ESEM ETEM nanoprocesses nanoprototyping Nanoprototyping
34 (SEM, FIB) (TEM) (Ångström) 1 0.1 nm 29 8 90 ( ) EDX X EDSX X X EELS (FIB) ESEM
35 ETEM X / X FEG FIB (DualBeam) FIB SEM LMIS 1 (μm) (10-6 m) 1000 nm 1 (nm) (10-9 ) 360
36 SEM STEM TEM WDX X X WDX X Wehnelt X X 10-0.01 nm X FEI Daniel Beniac Public Health Agency of Canada Lyubov Belova, Royal Institute of Technology Randy Burgess, Hewlett Packard Clifford Barnes University of Ulster Laura Tormo Cifuentes, Museo Nacional de Ciencias Naturales-CSIC Philippe Crassous, Ifremer Angela DiFiore, RJ Lee Group, Inc Christian Gspan, Institut für Elektronenmikroskopie Paul Gunning, Smith & Nephew Frans Holthuysen, Philips Research Jim Ito Yorkhill Hospital Glascow Scotland, UK Wann-Neng Jane, Academia Sinica Craig Johnson Avigail Keller C.Kisielowski NCEM, UC Berkley Alexey Kolomiytsev, Taganrog University Daniel Mathys, ZMB, Universität Basel Oliver Meckes, Eye of Science Nicole Ottawa, Eye of Science Harald Plank, Institute for Electron Microscopy Francisco Rangel, MCT/INT/CETENE Michael Rogers, Institut für Elektronenmikroskopie Hagen Roetz, Infi neon Technologies Dresden GmbH & Co.OHG Harald Rösner Institut für Materialphysik J.Thibault, Marseille Matthew Weyland Monash Centre for Electron Microscopy Hong Zhou, University of California at Los Angeles, USA FEI NanoPort and Applications Engineers
FEI.com FEI www.fei.com FPO http://www.fei.com/feedback.aspx 30% TÜV 2010. FEI DualBeam Nova Magellan Titan Tecnai Osiris V400ACE Vitrobot FEI FEI 0T0005-CN 07-2010
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