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6/30 (1) @2005 MFM 100% MFM2010
7/30 (1) 10nm (2006.6) 2 @ MFM CoFeCT300/3 PC100 MFM II-T MFMH16/12/28 H17/12/27~28
8/30 (1) H. Kuramochi, T. Uzumaki, M. Yasutake, A. Tanaka, H. Akinaga and H. Yokoyama: Magnetic Force Microscope using CoFe-Coated Carbon anotube Probes: anotechnology: Vol.16, o.1, p.24 (2005).,,,, : :: Vol.29, p.767 (2005). H. Akinaga: Magnetic force microscope using carbon nanotube probes: Moscow International ymposium on Magnetism:Moscow:2005.6.28:Plenary :: 2004.3.18 5 1. "": : 2004/6/26 2. "": HM: 2004/6/26 3. : : 2006/5/25 11 4. 5. 2005/1/13
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11/30 10 ()3 RF source power 150 W Ti i-fe CH 4 100% (1) PC220 1000/2
12/30 (1) 2005-268349 ( H17/09/29 ) usumu Watanabe, Wilson Agerico Dino, Hiroshi akanishi, Hideaki Kasai and Hiroyuki Akinaga: Reactive Ion Etching of ife Thin Films from First-Principles tudy: A Case tudy: Japanes journal of Applied Physics: Vol.44, o. 2, pp.893-894 (2005).,,, W.A.T. Dino:: : (2006). H. Kasai,. Watanabe, W.A. Dino, M. David, R. Muhida, H. akanishi,. Matsumoto, H. Akinaga: Ab-initio Based RIE Process Design for Magnetic Thin Films: 50th Magnetism and Magnetic Materials(MMM): an Jose, Calfornia, UA: 2005.11.1
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16/30 (2) (-2-11118 + BuT H H H H H H H H H H H H H H H H Resistance ( 10 11 10 10 10 9 10 8 10 7 H 2 F H -BuT 1 I (na) 0 Electrodes +BuT H 3 C(H 2 C) 3 CH 3 H 10 6 H A,T,G,C +BuT H H 2 -BuT +BuT -BuT +BuT -BuT F H 2 H Ac H H H H -1-1 0 1 V (V) H H Ac H n
17/30 (2) 2-10nm 2-10nm 800 ( 10 mm 10 mm) W = 1.8m (a) Metal strip A 90nm i 2 Metal strip B Metal strip C anogap 5 nm Metal nanowire 60 nm <5nm 10300nm 50nm1.2m 1800 (-2-102-107 500 nm M PdCl2 in water, 1 M realtime detection (-2-119 time / sec
18/30 (2) H13 H14 H15 H16 H17 : :,,,, : : 2004-2004- 259748 259748 :, :,,, : : 2005-11901 2005-11901 : :,, :,, : 2005-79335 2005-79335 : :,,,,,,,,,,, :, : 2005-175164 2005-175164 : : : : 2006-2006- 128438 128438 : : : 2005-127998 : 2005-127998 Z H 1 X Y Metal nanowire W G i 2 (300nm)/i substrate H2 H G -2-106 : : : 2006-58020 : 2006-58020 : : : : 2006-180751 2006-180751 26-: 26-: : 2005-065072: : 2005-065072: : : : : 2005-077063: 2005-077063: (II):,, (II):,,, :, : 2005-266198 2005-266198
19/30 (2) H13 H14 H15 H16 H17 :anotech2006 : :2006.2.21-2.23 18 ED (1)(2) : :2006.2.21 : anotech2005 : 2005/2/23-2005/2/25 :The Award for Innovative Analytical Research Presented as a Poster: Federation of Analytical Chemistry and pectroscopy ocieties: Temperature dependence of ER blinking: 2003.10.21,,, : ilver Medal: e-jt Paper of The Year 2003: : A Reliable Method for Fabricating sub 10 nm Gap Junctions Without Using Electron Beam Lithography : 2004.1.15
(2) 20/30 PJ DA YE DA TUM ECA U..Genomics anosphere Helicos DA PCRDA1999 etc. IH $1000/DA(30 $10/DA $1000/DA
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24/30 (3) 1m 5m H. Kuramochi et al., urf.cience 566 (2004) 343. H. Kuramochi et al., anotechnology 15 (2004) 1126.
25/30 (3) I-V w/o light Current (pa) 2.0 1.5 1.0 0.5 0.0-0.5 9.5 10.0 10.5 11.0 11.5 Time (s) i ii iii 12.0 12.5 I i ii iii B A Intensity [a.u.] 0.3 0.25 0.2 0.15 0.1 0.05 0 t= 1.6 nm V b = 2.0 V Low intensity of light natural ox t=0.3 nm 1.0 nm 1.6 nm 0 t -0.05 1.5 2 2.5 3 3.5 4 4.5 5 5.5 Photon Energy [ev] H. Kuramochi et al., Appl.Phys.Lett. 84 (2004) 4005. 2.4 nm i
26/30 (3) 10nm 10nm1nm H. Kuramochi et al., urf.cience 566 (2004) 349.
27/30 (3) 5,10,15,20nm 5-20nm CoPt / CoTEM T. eto et.al, i/item K. akiyama et. al.j. Phys. Chem, B(2004) J. Photochem. Photobio.(2006)A CoPt/i22.5nm +VL PLER CoPt / i 2 PTEM T. eto et.al, J. Photochem. Photobio.(2006)B PiER. Fukata et. al.appl. Phys. Letters (2005)
28/30 (3) i/i, CoPt/Co, CoPt/i 2 2.5nm 10 20 Magnetization [emu/cc] 1000 500 0-500 -1000 CoPt (15nm) 5K, zero field cooled sample 1 sample 2 sample 3-40 -20 0 20 40 Magnetic field [x10 3 e] Magnetization [emu/cc] 400 200 0-200 -400 CoPt (15nm) 5K, zero field cooled sample 1 sample 2 sample 3-2000 -1000 0 1000 2000 Magnetic field [e] Moment [x10-6 emu] Moment [x10-6 emu] 5 0-5 -10 40 20 0-20 -40 (a) d core =2nm -4000-2000 0 2000 4000 Magnetic field [e] (b) d core =2.5nm -4000-2000 0 2000 4000 Magnetic field [e] Moment [x10-6 emu] Moment [x10-6 emu] 10 0-10 -20 40 20 0-20 -40 (c) d core =5nm -4000-2000 0 2000 4000 Magnetic field [e] (d) d core =7.5nm -4000-2000 0 2000 4000 Magnetic field [e] CoPt / Co(5K) CoPt / i 2 T. eto et.al, J. Photochem. Photobio.(2006)A T. eto et. al.j. Photochem. Photobio.(2006)B VL
29/30 (3) Current (pa) 4 2 0-2 -4 2 4 6 8 10 12 Time (s) 20 10 0-10 -20 Voltage (V),,,,, :2002-271323(): 2002.9.18:,,,,, :2003-44876(): 2003.2.21:
30/30 (3) CT Appl. Phys. Lett. 3 7 CT App. Phys. Lett. 4 5 urf. cience 3 1 J. Appl. Phys. 2 Thin olid Films 4 3 J. Phys. Chem. 1 8 nanotech
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